Indexed metadata

Finite-length mask effects in the isolation oxidation of silicon

J. Evans

Source record

Source: Crossref

Published: Apr 1, 1997

DOI: 10.1093/imamat/58.2.121

Open original source ↗

Evidence graph

No public relationships recorded yet.

Integrity note: This page is a factual metadata record created by deterministic ingestion. It is not a claim that the work moves a mathematical frontier or has been independently verified.

Finite-length mask effects in the isolation oxidation of silicon — Mathematical Frontier Network