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Effect of rapid thermal annealing on damage of silicon matrix implanted by low-energy rhenium ions

I.N. Demchenko, Y. Melikhov, M.S. Walczak, R. Ratajczak, K. Sobczak, A. Barcz, R. Minikaev, E. Dynowska, J.Z. Domagala, M. Chernyshova, Y. Syryanyy, N.V. Gavrilov, M. Sawicki

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Source: Crossref

Published: Dec 1, 2020

DOI: 10.1016/j.jallcom.2020.156433

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Effect of rapid thermal annealing on damage of silicon matrix implanted by low-energy rhenium ions — Mathematical Frontier Network