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A Mathematical Model of Silicon Chemical Vapor Deposition: Further Refinements and the Effects of Thermal Diffusion

Michael E. Coltrin, Robert J. Kee, James A. Miller

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Source: Crossref

Published: Jun 1, 1986

DOI: 10.1149/1.2108820

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A Mathematical Model of Silicon Chemical Vapor Deposition: Further Refinements and the Effects of Thermal Diffusion — Mathematical Frontier Network